| 000 | 01676nam a2200205Ia 4500 | ||
|---|---|---|---|
| 008 | 220216s9999 xx 000 0 und d | ||
| 100 | _aRay D | ||
| 245 | 0 | _aSignificance of the leaf area ratio in Hevea brasiliensis under high irradiance and low temperature stress | |
| 260 |
_bPhotosynthetica _c2004 |
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| 300 | _a93-97 | ||
| 520 | _aAdjustment in leaf area : mass ratio called leaf area ratio (LAR) is one of the strategies to optimize photon harvesting. LAR was recorded for 10 genotypes of Hevea brasiliensis under high irradiance and low temperature and the genotypes were categorized into two groups, i.e. high LAR and low LAR types. Simultaneously, the growth during summer as well as winter periods, photosynthetic characteristics, and in-vitro oxidative damage were studied. Low LAR (19.86+_0.52 m2 kg -1) types, recorded an average of 18.0;chlorophyll (Chl) degradation under high irradiance and 7.1;Chl degradation under low temperature. These genotypes maintained significantly higher net photosynthetic rate (PN) of 10.4 Mmol(CO2)m-2 s-1 during winter season. On the contrary, the ihgh LAR (24.33+_0.27 m2 kg-1) types recorded significantly lower PN of 4 Mmol(CO2) m-2 s-1 and greater Chl degradation of 37.7 and 13.9;under high irradiance and low temperature stress, respectively. Thus LAR may be one of the physiological traits, which are possibly involved in plant acclimation process under both stresses studied. | ||
| 650 | _aLeaf area ratio | ||
| 650 | _aLow temperature stress | ||
| 650 | _aNet photosynthetic rate | ||
| 650 | _aPhoto-oxidative damage | ||
| 650 | _aStomatal conductance | ||
| 700 | _aDas G | ||
| 700 | _aDey S K | ||
| 942 | _cJS | ||
| 999 |
_c68686 _d68686 |
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